Invention Grant
- Patent Title: Process for producing silicon compound having oxetanyl group
- Patent Title (中): 具有氧杂环丁烷基的硅化合物的制造方法
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Application No.: US13128308Application Date: 2009-12-14
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Publication No.: US08110613B2Publication Date: 2012-02-07
- Inventor: Sayaka Oike , Akinori Kitamura , Hiroshi Suzuki
- Applicant: Sayaka Oike , Akinori Kitamura , Hiroshi Suzuki
- Applicant Address: JP Tokyo
- Assignee: Toagosei Co., Ltd.
- Current Assignee: Toagosei Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-332075 20081226
- International Application: PCT/JP2009/070845 WO 20091214
- International Announcement: WO2010/073933 WO 20100701
- Main IPC: C08G65/18
- IPC: C08G65/18 ; C07D305/06

Abstract:
Provided is a method for efficiently producing a cationically curable condensed silicon compound. There was an unsolved problem that, in a condensation reaction, an oxetanyl group is subjected to ring-opening under an acidic condition, while gelation is easily caused under an alkaline condition. It was found that a silicon compound (C) having an oxetanyl group can be obtained without causing gelation even at a high concentration by the present method including a first step of separately subjecting a silicon compound (A) having four siloxane bond-forming groups and a silicon compound (B) having an oxetanyl group to alcohol exchange reaction with 1-propanol and a second step of subjecting silicon compounds (AP) and (BP) undergone the first step to hydrolytic copolycondensation under an alkaline condition at a specific ratio.
Public/Granted literature
- US20110245448A1 PROCESS FOR PRODUCING SILICON COMPOUND HAVING OXETANYL GROUP Public/Granted day:2011-10-06
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