Invention Grant
- Patent Title: Charged particle optical system comprising an electrostatic deflector
- Patent Title (中): 带有静电偏转器的带电粒子光学系统
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Application No.: US12769712Application Date: 2010-04-29
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Publication No.: US08110813B2Publication Date: 2012-02-07
- Inventor: Norman Hendrikus Rudolf Baars , Gerardus Fernandus Ten Berge , Stijn Willem Herman Karel Steenbrink
- Applicant: Norman Hendrikus Rudolf Baars , Gerardus Fernandus Ten Berge , Stijn Willem Herman Karel Steenbrink
- Applicant Address: NL Delft
- Assignee: Mapper Lithography IP B.V.
- Current Assignee: Mapper Lithography IP B.V.
- Current Assignee Address: NL Delft
- Agency: Hoyng Monegier LLP
- Agent David P. Owen; Coraline J. Haitjema
- Main IPC: H01J37/317
- IPC: H01J37/317

Abstract:
A charged particle optical system comprising a beamlet generator for generating a plurality of beamlets of charged particles and an electrostatic deflector for deflecting the beamlets. The electrostatic deflector comprises first and second electrodes adapted for connection to a voltage for generating an electric field between the electrodes for deflection of the beamlets, the electrodes being at least partially freestanding in an active area of the electrostatic deflector. The electrodes define at least one passing window for passage of at least a portion of the beamlets between the electrodes, the passing window having a length in a first direction and a width in a transverse direction. The system is adapted to arrange the beamlets in at least one row and to direct a single row of the beamlets through the passing window of the electrostatic deflector, the beamlets of the row extending in the first direction. A substantial part of the electrostatic deflector extends beyond the passing window in the first direction.
Public/Granted literature
- US20100276606A1 Charged particle optical system comprising an electrostatic deflector Public/Granted day:2010-11-04
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