Invention Grant
- Patent Title: Method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system
- Patent Title (中): 控制由带电粒子束成像系统检查的晶片样品上的颗粒吸收的方法
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Application No.: US12247536Application Date: 2008-10-08
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Publication No.: US08110818B2Publication Date: 2012-02-07
- Inventor: You-Jin Wang , Chung-Shih Pan
- Applicant: You-Jin Wang , Chung-Shih Pan
- Applicant Address: TW Hsinchu
- Assignee: Hermes Microvision, Inc.
- Current Assignee: Hermes Microvision, Inc.
- Current Assignee Address: TW Hsinchu
- Agency: Muncy, Geissler, Olds & Lowe, PLLC
- Main IPC: G01N23/04
- IPC: G01N23/04 ; H01J37/26
Abstract:
A method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system prevents particle absorption by grounding the wafer sample and kept electrically neutral during the transfer-in and transfer-out process.
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