Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
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Application No.: US12502251Application Date: 2009-07-14
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Publication No.: US08110870B2Publication Date: 2012-02-07
- Inventor: Masahiro Sugimoto , Tsutomu Uesugi , Masakazu Kanechika , Tetsu Kachi
- Applicant: Masahiro Sugimoto , Tsutomu Uesugi , Masakazu Kanechika , Tetsu Kachi
- Applicant Address: JP Toyota-shi, Aichi-ken
- Assignee: Toyota Jidosha Kabushiki Kaisha
- Current Assignee: Toyota Jidosha Kabushiki Kaisha
- Current Assignee Address: JP Toyota-shi, Aichi-ken
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Priority: JP2008-183496 20080715
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
A semiconductor device has a semiconductor substrate having a surface layer and a p-type semiconductor region, wherein the surface layer includes a contact region, a channel region and a drift region, the channel region is adjacent to and in contact with the contact region, the drift region is adjacent to and in contact with the channel region and includes n-type impurities at least in part, and the p-type semiconductor region is in contact with the drift region and at least a portion of a rear surface of the channel region, a main electrode disposed on the surface layer and electrically connected to the contact region, a gate electrode disposed on the surface layer and extending from above a portion of the contact region to above at least a portion of the drift region via above the channel region, and an insulating layer covering at least the portion of the contact region and not covering at least the portion of the drift region. The gate electrode and the contact region are insulated by the insulating layer, and the gate electrode and the drift region are in direct contact to form a Schottky junction.
Public/Granted literature
- US20100013006A1 SEMICONDUCTOR DEVICE Public/Granted day:2010-01-21
Information query
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