Invention Grant
- Patent Title: High voltage transistor
- Patent Title (中): 高压晶体管
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Application No.: US12339448Application Date: 2008-12-19
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Publication No.: US08110873B2Publication Date: 2012-02-07
- Inventor: Sung-Gon Choi , Hee-Seog Jeon
- Applicant: Sung-Gon Choi , Hee-Seog Jeon
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG Electronics Co., Ltd.
- Current Assignee: SAMSUNG Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Stanzione & Kim, LLP
- Priority: KR10-2007-134337 20071220
- Main IPC: H01L21/76
- IPC: H01L21/76

Abstract:
A high voltage transistor that includes a substrate where an active region is defined, a first impurity region and a second impurity region in the active region and a third impurity region between the first and second impurity regions, and a first gate electrode on the active region between the first impurity region and the third impurity region and a second gate electrode on the active region between the second impurity region and the third impurity region.
Public/Granted literature
- US20090194815A1 HIGH VOLTAGE TRANSISTOR Public/Granted day:2009-08-06
Information query
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