Invention Grant
- Patent Title: Electron beam generating apparatus
- Patent Title (中): 电子束发生装置
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Application No.: US12281713Application Date: 2007-02-08
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Publication No.: US08110974B2Publication Date: 2012-02-07
- Inventor: Tatsuya Matsumura
- Applicant: Tatsuya Matsumura
- Applicant Address: JP Hamamatsu-shi, Shizuoka
- Assignee: Hamamatsu Photonics K.K.
- Current Assignee: Hamamatsu Photonics K.K.
- Current Assignee Address: JP Hamamatsu-shi, Shizuoka
- Agency: Drinker Biddle & Reath LLP
- Priority: JP2006-066486 20060310
- International Application: PCT/JP2007/052207 WO 20070208
- International Announcement: WO2007/105390 WO 20070920
- Main IPC: H01J33/00
- IPC: H01J33/00

Abstract:
An electron beam generating apparatus (1a) includes an electron gun (2), a vacuum container (3), a frame material (11), and a window material (13). The electron gun (2) has a filament (7) from which an electron beam (EB) is emitted. The vacuum container (3) holds the filament (7). The frame material (11) has an electron passing hole (11c) through which the electron beam (EB) passes, and is detachably attached to the vacuum container (3). The window material (13) is bonded (brazed) to the frame material (11) so as to airtightly stop up the electron passing hole (11c), and allows the electron beam (EB) to penetrate therethrough.
Public/Granted literature
- US20090212681A1 ELECTRON BEAM GENERATING APPARATUS Public/Granted day:2009-08-27
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