Invention Grant
US08111129B2 Resistor and design structure having substantially parallel resistor material lengths
有权
电阻器和设计结构具有基本上平行的电阻器材料长度
- Patent Title: Resistor and design structure having substantially parallel resistor material lengths
- Patent Title (中): 电阻器和设计结构具有基本上平行的电阻器材料长度
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Application No.: US12046643Application Date: 2008-03-12
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Publication No.: US08111129B2Publication Date: 2012-02-07
- Inventor: Mark C. Hakey , Stephen E. Luce , James S. Nakos
- Applicant: Mark C. Hakey , Stephen E. Luce , James S. Nakos
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Hoffman Warnick LLC
- Agent Anthony Canale
- Main IPC: H01C1/012
- IPC: H01C1/012
Abstract:
A resistor and design structure including a pair of substantially parallel resistor material lengths separated by a first dielectric are disclosed. The resistor material lengths have a sub-lithographic dimension and may be spacer shaped.
Public/Granted literature
- US20090231087A1 RESISTOR AND DESIGN STRUCTURE HAVING SUBSTANTIALLY PARALLEL RESISTOR MATERIAL LENGTHS Public/Granted day:2009-09-17
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