Invention Grant
- Patent Title: Beam shaping device
- Patent Title (中): 光束成形装置
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Application No.: US12678517Application Date: 2008-09-12
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Publication No.: US08111338B2Publication Date: 2012-02-07
- Inventor: Ties Van Bommel , Rifat Ata Mustafa Hikmet , Thomas Caspar Kraan , Nathalie Magali Danielle Dessaud , Jan Frank Stromer
- Applicant: Ties Van Bommel , Rifat Ata Mustafa Hikmet , Thomas Caspar Kraan , Nathalie Magali Danielle Dessaud , Jan Frank Stromer
- Applicant Address: NL Eindhoven
- Assignee: Koninklijke Philips Electronics N.V.
- Current Assignee: Koninklijke Philips Electronics N.V.
- Current Assignee Address: NL Eindhoven
- Priority: EP07116843 20070920
- International Application: PCT/IB2008/053681 WO 20080912
- International Announcement: WO2009/037617 WO 20090326
- Main IPC: G02F1/13
- IPC: G02F1/13

Abstract:
A beam shaping device (1; 50; 60) comprising first (3) and second (4) substrates, a liquid crystal layer (2) sandwiched between the substrates, and a first electrode layer (5; 51) provided on a side of the first substrate (3) facing the liquid crystal layer (2). The beam shaping device is controllable between beam shaping states, each permitting passage of light through the beam shaping device, and further comprises an insulating layer (7) covering the first electrode layer (5; 51) and a second electrode layer (6; 53) provided on top of the insulating layer. The second electrode layer (6; 53) comprises a conductor pattern exposing a portion of the insulating layer (7). The beam shaping device is configured in such a way that application of a voltage (V) between the first (5; 51) and second (6; 53) electrode layers causes liquid crystal molecules comprised in a portion of the liquid crystal layer (2) corresponding to the exposed portion of the insulating layer to tilt in a plane perpendicular to the liquid crystal layer, resulting in a local refractive index gradient, thereby enabling shaping of a beam (8) of light passing through the beam shaping device.
Public/Granted literature
- US20100208185A1 BEAM SHAPING DEVICE Public/Granted day:2010-08-19
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