Invention Grant
- Patent Title: Exposure method and apparatus, and device production method
- Patent Title (中): 曝光方法及装置及装置制作方法
-
Application No.: US10588730Application Date: 2005-02-10
-
Publication No.: US08111378B2Publication Date: 2012-02-07
- Inventor: Kiyoshi Uchikawa
- Applicant: Kiyoshi Uchikawa
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2004-037183 20040213
- International Application: PCT/JP2005/002011 WO 20050210
- International Announcement: WO2005/078774 WO 20050825
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/68 ; G03B27/52
Abstract:
Disclosed is an exposure method which illuminates a first object with an exposure beam and exposes a second object with the exposure beam through the first object and a projection optical system, wherein at least a part of one of the first object and the projection optical system is irradiated with a light beam having a wavelength range different from that of the exposure beam through a space waveguide mechanism, to correct an imaging characteristic of the projection optical system.
Public/Granted literature
- US20080246933A1 Exposure Method And Apparatus, And Device Production Method Public/Granted day:2008-10-09
Information query
