Invention Grant
- Patent Title: Positioning apparatus, exposure apparatus and device manufacturing method
- Patent Title (中): 定位装置,曝光装置及装置的制造方法
-
Application No.: US12241664Application Date: 2008-09-30
-
Publication No.: US08111381B2Publication Date: 2012-02-07
- Inventor: Atsushi Kimura
- Applicant: Atsushi Kimura
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2007-261247 20071004
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03B27/64

Abstract:
A positioning apparatus includes a stage movable on a base, an actuator which drives the stage and a driver which supplies current to the actuator. The apparatus further includes a current supply path having a plurality of parallel paths connecting the driver and the actuator. The current supply path includes a plurality of forward electrical wires and a plurality of backward electrical wires. The apparatus also includes a detector which detects a break of the current supply path based on a current of at least one of the plurality of parallel paths. The detector detects a break of the current supply path based on a total current of at least one of the plurality of forward electrical wires and at least one of the plurality of backward electrical wires.
Public/Granted literature
- US20090091724A1 POSITIONING APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2009-04-09
Information query