Invention Grant
US08111390B2 Method and apparatus for residue detection in the edge deleted area of a substrate
失效
在基板的边缘缺失区域中进行残留物检测的方法和装置
- Patent Title: Method and apparatus for residue detection in the edge deleted area of a substrate
- Patent Title (中): 在基板的边缘缺失区域中进行残留物检测的方法和装置
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Application No.: US12425806Application Date: 2009-04-17
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Publication No.: US08111390B2Publication Date: 2012-02-07
- Inventor: Kenneth Tsai , Asaf Schlezinger
- Applicant: Kenneth Tsai , Asaf Schlezinger
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Diehl Servilla LLC
- Main IPC: G01N21/00
- IPC: G01N21/00
Abstract:
Apparatus and methods for detecting residue on a glass substrate and method of use are disclosed. The apparatus comprises a substrate support, a sensor, a controller and a peripheral device in communication with the controller. The apparatus measures the height or thickness of a main surface and an edge delete surface of a substrate to determine if film residue is present on the edge delete surface.
Public/Granted literature
- US20100265497A1 Method and Apparatus for Residue Detection in the Edge Deleted Area of a Substrate Public/Granted day:2010-10-21
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