Invention Grant
US08111398B2 Method of measurement, an inspection apparatus and a lithographic apparatus 有权
测量方法,检查装置和光刻设备

Method of measurement, an inspection apparatus and a lithographic apparatus
Abstract:
According to an example, a first layer of a substrate comprises a plurality of gratings having a periodicity P. A second layer of the substrate comprises a plurality of gratings, overlapping with the first set of gratings, and having a periodicity of NP, where N is an integer greater than 2. A first set of gratings has a bias of +d and the second set of gratings has a bias of −d. A beam of radiation is projected onto the gratings and the angle resolved spectrum of the reflected radiation detected. The overlay error is then calculated using the angle resolved spectrum of the reflected radiation.
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