Invention Grant
- Patent Title: Method of measurement, an inspection apparatus and a lithographic apparatus
- Patent Title (中): 测量方法,检查装置和光刻设备
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Application No.: US12770153Application Date: 2010-04-29
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Publication No.: US08111398B2Publication Date: 2012-02-07
- Inventor: Maurits Van der Schaar , Arie Jeffrey Den Boef , Everhardus Cornelis Mos
- Applicant: Maurits Van der Schaar , Arie Jeffrey Den Boef , Everhardus Cornelis Mos
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C
- Main IPC: G01B11/00
- IPC: G01B11/00 ; G03C5/00

Abstract:
According to an example, a first layer of a substrate comprises a plurality of gratings having a periodicity P. A second layer of the substrate comprises a plurality of gratings, overlapping with the first set of gratings, and having a periodicity of NP, where N is an integer greater than 2. A first set of gratings has a bias of +d and the second set of gratings has a bias of −d. A beam of radiation is projected onto the gratings and the angle resolved spectrum of the reflected radiation detected. The overlay error is then calculated using the angle resolved spectrum of the reflected radiation.
Public/Granted literature
- US20100277706A1 Method of Measurement, an Inspection Apparatus and a Lithographic Apparatus Public/Granted day:2010-11-04
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