Invention Grant
- Patent Title: Surface position detecting apparatus, surface position detecting method, exposure apparatus, and device manufacturing method
- Patent Title (中): 表面位置检测装置,表面位置检测方法,曝光装置和装置制造方法
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Application No.: US12265572Application Date: 2008-11-05
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Publication No.: US08111406B2Publication Date: 2012-02-07
- Inventor: Yasuhiro Hidaka
- Applicant: Yasuhiro Hidaka
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Main IPC: G01B11/14
- IPC: G01B11/14

Abstract:
A surface position detecting apparatus which detects position information of a predetermined surface in an object, comprising a first optical system which projects light from an oblique direction to the predetermined surface; a second optical system which receive the light from the object; a detecting system which receives the light from the second optical system and which detects the position information of the predetermined surface in a direction intersecting the predetermined surface based on the light; and a phase difference imparting system which is arranged in an optical path of at least one of the first and second optical systems and which imparts a phase difference between different portions from each other of light traveling via a surface other than the predetermined surface in the object, in the light from the second optical system.
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