Invention Grant
- Patent Title: Mass flow rate-controlling apparatus
- Patent Title (中): 质量流量控制装置
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Application No.: US10572046Application Date: 2005-02-03
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Publication No.: US08112182B2Publication Date: 2012-02-07
- Inventor: Yasukazu Tokuhisa , Takao Gotoh , Tohru Matsuoka , Shigehiro Suzuki
- Applicant: Yasukazu Tokuhisa , Takao Gotoh , Tohru Matsuoka , Shigehiro Suzuki
- Applicant Address: JP Tokyo
- Assignee: Hitachi Metals, Ltd.
- Current Assignee: Hitachi Metals, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2004-027306 20040203
- International Application: PCT/JP2005/001622 WO 20050203
- International Announcement: WO2005/076095 WO 20050818
- Main IPC: G05D11/00
- IPC: G05D11/00

Abstract:
A mass flow rate-controlling apparatus including a mass flow rate-detecting mechanism 8 a flow rate-controlling valve mechanism 10 and a mechanism 44 for controlling the flow rate-controlling valve mechanism based on a flow rate-setting signal S0 input from outside and a flow rate signal S1, the flow path being provided with a pressure-detecting mechanism 42 for detecting the pressure of the fluid to output the detected pressure signal, so that the controlling mechanism selectively switches a first control mode for controlling the mass flow rate based on the flow rate signal and the flow rate-setting signal without using the detected pressure signal, and a second control mode for controlling the mass flow rate based on the detected pressure signal, the flow rate signal and the flow rate-setting signal, based on a pressure variation obtained from the detected pressure signal.
Public/Granted literature
- US20070198131A1 Mass flow rate-controlling apparatus Public/Granted day:2007-08-23
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