Invention Grant
- Patent Title: Method of monitoring a substrate patterning process
- Patent Title (中): 监测基板图案化工艺的方法
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Application No.: US11976633Application Date: 2007-10-26
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Publication No.: US08114267B2Publication Date: 2012-02-14
- Inventor: Staffan Nordlinder , Nathaniel D. Robinson , Payman Therani
- Applicant: Staffan Nordlinder , Nathaniel D. Robinson , Payman Therani
- Applicant Address: SE Kista
- Assignee: Acreo AB
- Current Assignee: Acreo AB
- Current Assignee Address: SE Kista
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: EP06123108 20061027
- Main IPC: G02F1/00
- IPC: G02F1/00
Abstract:
A method for monitoring a substrate patterning process, where at least two electrodes are used to apply a voltage to the substrate to cause a reaction in a portion of the substrate, that includes recording a current driven by said voltage as a function of time and/or as a function of a position of the substrate or a patterning mask. Also disclosed are a device and a computer program product for monitoring the substrate patterning process.
Public/Granted literature
- US20080156663A1 Method, device and computer program product of monitoring a substrate patterning process Public/Granted day:2008-07-03
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