Invention Grant
- Patent Title: Reflective photomask and method of fabricating, reflective illumination system and method of process using the same
- Patent Title (中): 反光光掩模及其制造方法，反光照明系统及其使用方法
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Application No.: US12656668Application Date: 2010-02-12
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Publication No.: US08119309B2Publication Date: 2012-02-21
- Inventor: Dong-Gun Lee , Seong-Sue Kim , Hwan-Seok Seo , In-Sung Kim
- Applicant: Dong-Gun Lee , Seong-Sue Kim , Hwan-Seok Seo , In-Sung Kim
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2009-0010344 20090209
- Main IPC: G03F1/00
- IPC: G03F1/00 ; G03F9/00
Abstract:
A reflective photomask includes a phase shift object on a substrate, a reflective layer stacked on the substrate and the phase shift object, a capping layer on the reflective layer, the capping layer including at least one surface portion having a bent shape, and a light absorption pattern on the capping layer, the light absorption pattern including at least one slit exposing the surface portion of the capping layer having the bent shape.
Public/Granted literature
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