Invention Grant
- Patent Title: Image sensor and fabricating method thereof
- Patent Title (中): 图像传感器及其制造方法
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Application No.: US12344450Application Date: 2008-12-26
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Publication No.: US08119433B2Publication Date: 2012-02-21
- Inventor: Keun-Hyuk Lim
- Applicant: Keun-Hyuk Lim
- Applicant Address: KR Seoul
- Assignee: Dongbu HiTek Co., Ltd.
- Current Assignee: Dongbu HiTek Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Sherr & Vaughn, PLLC
- Priority: KR10-2007-0139390 20071227
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
An image sensor includes an insulating interlayer including a metal line on a semiconductor substrate, a photodiode pattern provided on the insulating interlayer to be connected to the metal line, the photodiode pattern separated per unit pixel by a gap area, a device isolation insulating layer provided on the insulating interlayer including the photodiode pattern and the gap area, a contact hole provided to the device isolation insulating layer to expose the photodiode pattern and a neighbor photodiode pattern, and a contact plug provided to the contact hole to be connected to a plurality of the photodiode patterns.
Public/Granted literature
- US20090166776A1 IMAGE SENSOR AND FABRICATING METHOD THEREOF Public/Granted day:2009-07-02
Information query
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