Invention Grant
- Patent Title: Nitride semi-conductor light emitting device and a process of producing a nitride semi-conductor light emitting device
- Patent Title (中): 氮化物半导体发光器件和制造氮化物半导体发光器件的工艺
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Application No.: US12621364Application Date: 2009-11-18
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Publication No.: US08120013B2Publication Date: 2012-02-21
- Inventor: Takayoshi Takano , Kenji Tsubaki , Hideki Hirayama , Sachie Fujikawa
- Applicant: Takayoshi Takano , Kenji Tsubaki , Hideki Hirayama , Sachie Fujikawa
- Applicant Address: JP Osaka JP Saitama
- Assignee: Panasonic Electric Works Co., Ltd.,Riken
- Current Assignee: Panasonic Electric Works Co., Ltd.,Riken
- Current Assignee Address: JP Osaka JP Saitama
- Agency: Cheng Law Group, PLLC
- Priority: JP2009-104407 20090422
- Main IPC: H01L33/00
- IPC: H01L33/00

Abstract:
A nitride semi-conductor light emitting device has a p-type nitride semi-conductor layer 7, an n-type nitride semi-conductor layer 3, and a light emission layer 6 which is interposed between the p-type nitride semi-conductor layer 7 and the n-type nitride semi-conductor layer 3. The light emission layer 6 has a quantum well structure with a barrier layer 6b and a well layer 6a. The barrier layer 6b is formed of AlaGabIn(1-a-b)N (0 0), and contains a first impurity at a concentration of A greater than zero. The well layer 6a is formed of AlcGadIn(1-c-d)N (0 0), and contains a second impurity at a concentration of B equal to or greater than zero. In the nitride semi-conductor light emitting device of the present invention, the concentration of A is larger than that of B, in order that the barrier layer 6b has a concentration of oxygen smaller than that in the well layer 6a.
Public/Granted literature
- US20100270532A1 NITRIDE SEMI-CONDUCTOR LIGHT EMITTING DEVICE Public/Granted day:2010-10-28
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