Invention Grant
- Patent Title: Stratified photodiode for high resolution CMOS image sensor implemented with STI technology
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Application No.: US12608734Application Date: 2009-10-29
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Publication No.: US08120069B2Publication Date: 2012-02-21
- Inventor: Jaroslav Hynecek
- Applicant: Jaroslav Hynecek
- Applicant Address: US DE Wilmington
- Assignee: Intellectual Ventures II LLC
- Current Assignee: Intellectual Ventures II LLC
- Current Assignee Address: US DE Wilmington
- Agency: McAndrews, Held & Malloy, Ltd.
- Priority: KR2005-0134243 20051229; KR2006-0038536 20060428
- Main IPC: H01L27/146
- IPC: H01L27/146

Abstract:
A stratified photodiode for high resolution CMOS image sensors implemented with STI technology is provided. The photodiode includes a semi-conductive layer of a first conductivity type, multiple doping regions of a second conductivity type, multiple doping regions of the first conductivity type, and a pinning layer. The multiple doping regions of the second conductivity type are formed to different depths in the semi-conductive layer. The multiple doping regions of the first conductivity type are disposed between the multiple doping regions of the second conductivity type and form multiple junction capacitances without full depletion. In particular, the stratified doping arrangement allows the photodiode to have a small size, high charge storage capacity, low dark current, and low operation voltages.
Public/Granted literature
- US20100044812A1 STRATIFIED PHOTODIODE FOR HIGH RESOLUTION CMOS IMAGE SENSOR IMPLEMENTED WITH STI TECHNOLOGY Public/Granted day:2010-02-25
Information query
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