Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US12314075Application Date: 2008-12-03
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Publication No.: US08120749B2Publication Date: 2012-02-21
- Inventor: Sjoerd Nicolaas Lambertus Donders , Bob Streefkerk , Martinus Hendrikus Antonius Leenders
- Applicant: Sjoerd Nicolaas Lambertus Donders , Bob Streefkerk , Martinus Hendrikus Antonius Leenders
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52 ; G03B27/32

Abstract:
An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.
Public/Granted literature
- US20090086181A1 Lithographic apparatus and device manufacturing method Public/Granted day:2009-04-02
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