Invention Grant
- Patent Title: Exposure apparatus and method of manufacturing device
- Patent Title (中): 曝光装置及其制造方法
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Application No.: US12482797Application Date: 2009-06-11
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Publication No.: US08120750B2Publication Date: 2012-02-21
- Inventor: Tadashi Hattori
- Applicant: Tadashi Hattori
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2008-158550 20080617
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52

Abstract:
When a substrate stage is located in a first area, a first measurement device measures the same portion of the substrate at the plural measurement points both before and after the stage is horizontally driven. A controller calculates a first difference of the stage in the vertical direction in the first area accompanying driving of the stage horizontally, based on a first measurement result, calculates a value representing a surface shape of the substrate by subtracting the first difference from the first measurement result, calculates a second difference of the stage in the vertical direction in the second area accompanying driving of the stage horizontally by subtracting the value from a value representing a vertical position of the substrate when the stage is located in the second area, and controls a vertical position of the stage in the second area based on the second difference.
Public/Granted literature
- US20090310109A1 EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE Public/Granted day:2009-12-17
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