Invention Grant
- Patent Title: Lithographic apparatus
- Patent Title (中): 平版印刷设备
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Application No.: US12466185Application Date: 2009-05-14
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Publication No.: US08120752B2Publication Date: 2012-02-21
- Inventor: Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen
- Applicant: Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/72
- IPC: G03B27/72

Abstract:
A zone plate includes a plurality of consecutively arranged, adjacent, and alternating first and second regions. The first regions are arranged to be substantially transparent to a first predetermined wavelength of radiation and a second predetermined wavelength of radiation that is different from the first predetermined wavelength of radiation. The second regions are arranged to be substantially opaque, diffractive, or reflective to the first predetermined wavelength of radiation and substantially transparent to the second predetermined wavelength of radiation.
Public/Granted literature
- US20090284725A1 LITHOGRAPHIC APPARATUS Public/Granted day:2009-11-19
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