Invention Grant
- Patent Title: Waveplate utilizing form birefringence and waveplate manufacturing method
- Patent Title (中): 波片利用形式双折射和波片制造方法
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Application No.: US11948343Application Date: 2007-11-30
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Publication No.: US08120848B2Publication Date: 2012-02-21
- Inventor: Taisuke Isano
- Applicant: Taisuke Isano
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2006-351095 20061227
- Main IPC: G02B5/30
- IPC: G02B5/30
Abstract:
A waveplate including a dielectric substrate and a periodic structure formed on the dielectric substrate, said periodic structure having a period which is equal to or smaller than a wavelength of an incident light, wherein the periodic structure is constructed of a deposited film, and a refractive index of the deposited film gradually changes in a thicknesswise direction of the deposited film.
Public/Granted literature
- US20080158674A1 WAVEPLATE UTILIZING FORM BIREFRINGENCE AND WAVEPLATE MANUFACTURING METHOD Public/Granted day:2008-07-03
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