Invention Grant
- Patent Title: Mask pattern verifying method
- Patent Title (中): 掩模图案验证方法
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Application No.: US12052066Application Date: 2008-03-20
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Publication No.: US08121387B2Publication Date: 2012-02-21
- Inventor: Mitsuyo Asano , Shinji Yamaguchi , Satoshi Tanaka , Soichi Inoue , Masamitsu Itoh , Osamu Ikenaga
- Applicant: Mitsuyo Asano , Shinji Yamaguchi , Satoshi Tanaka , Soichi Inoue , Masamitsu Itoh , Osamu Ikenaga
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2007-075482 20070322
- Main IPC: G06Q10/00
- IPC: G06Q10/00
Abstract:
A mask pattern verifying method include obtaining first information about a hot spot from design data of a mask pattern, obtaining second information about the mask pattern actually formed on a photo mask, and determining a measuring spot of the mask pattern actually formed on the photo mask, based on the first and second information.
Public/Granted literature
- US20080232671A1 MASK PATTERN VERIFYING METHOD Public/Granted day:2008-09-25
Information query
