Invention Grant
- Patent Title: Method for manufacturing electronic device
- Patent Title (中): 电子设备制造方法
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Application No.: US12050598Application Date: 2008-03-18
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Publication No.: US08121394B2Publication Date: 2012-02-21
- Inventor: Takashi Miyauchi
- Applicant: Takashi Miyauchi
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-071224 20070319
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
A method for manufacturing an electronic device is provided. The method includes: pressure-bonding a plurality of terminals of an electronic component to a plurality of electrodes formed on a surface of a transparent substrate, respectively, via an anisotropic conductive film to mount the electronic component on the transparent substrate; obtaining an image of the electrodes by imaging the transparent substrate with the electronic component mounted thereon from backside of the transparent substrate; measuring the number of indentations for each said electrode using the image of the electrode, the indentation being formed when the electrode is pressed by a conductive particle in the anisotropic conductive film; calculating an average and a standard deviation of the number of indentations per electrode throughout the transparent substrate; and calculating a probability that the number of indentations per electrode is less than a reference value on basis of the average and the standard deviation.
Public/Granted literature
- US20080232673A1 METHOD FOR MANUFACTURING ELECTRONIC DEVICE Public/Granted day:2008-09-25
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