Invention Grant
US08121723B2 Substrate transfer system, substrate transfer apparatus and storage medium
有权
基板转印系统,基板转印装置和存储介质
- Patent Title: Substrate transfer system, substrate transfer apparatus and storage medium
- Patent Title (中): 基板转印系统,基板转印装置和存储介质
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Application No.: US11524280Application Date: 2006-09-21
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Publication No.: US08121723B2Publication Date: 2012-02-21
- Inventor: Toshihiko Iijima , Shinya Shimizu
- Applicant: Toshihiko Iijima , Shinya Shimizu
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2005-276441 20050922
- Main IPC: G06F7/00
- IPC: G06F7/00

Abstract:
A substrate transfer system includes a substrate storing apparatus for storing therein one or more substrates; at least one substrate processing apparatus for performing a predetermined processing on the substrate; and a substrate transfer apparatus for transferring the substrate by moving between the substrate storing apparatus and the substrate processing apparatus, the substrate transfer apparatus including at least one substrate transfer unit for supporting the substrate, unloading the substrate from the substrate storing apparatus or the substrate processing apparatus, and loading the substrate into the substrate storing apparatus of the substrate processing apparatus. The substrate transfer apparatus moves while supporting the substrate by the substrate transfer unit.
Public/Granted literature
- US20070062446A1 Substrate transfer system, substrate transfer apparatus and storage medium Public/Granted day:2007-03-22
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