Invention Grant
- Patent Title: Single electron transistor
- Patent Title (中): 单电子晶体管
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Application No.: US13152900Application Date: 2011-06-03
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Publication No.: US08124961B2Publication Date: 2012-02-28
- Inventor: Sung-Dae Suk , Kyoung-Hwan Yeo , Ming Li , Yun-Young Yeoh
- Applicant: Sung-Dae Suk , Kyoung-Hwan Yeo , Ming Li , Yun-Young Yeoh
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR2006-97507 20061004
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L31/00 ; H01L21/02

Abstract:
A single electron transistor includes source/drain layers disposed apart on a substrate, at least one nanowire channel connecting the source/drain layers, a plurality of oxide channel areas in the nanowire channel, the oxide channel areas insulating at least one portion of the nanowire channel, a quantum dot in the portion of the nanowire channel insulated by the plurality of oxide channel areas, and a gate electrode surrounding the quantum dot.
Public/Granted literature
- US20110233523A1 SINGLE ELECTRON TRANSISTOR Public/Granted day:2011-09-29
Information query
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