Invention Grant
US08125012B2 Non-volatile memory device with a silicon nitride charge holding film having an excess of silicon
有权
具有氮化硅电荷保持膜的非易失性存储器件具有过量的硅
- Patent Title: Non-volatile memory device with a silicon nitride charge holding film having an excess of silicon
- Patent Title (中): 具有氮化硅电荷保持膜的非易失性存储器件具有过量的硅
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Application No.: US11639134Application Date: 2006-12-15
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Publication No.: US08125012B2Publication Date: 2012-02-28
- Inventor: Toshiyuki Mine , Kan Yasui , Tetsuya Ishimaru , Yasuhiro Shimamoto
- Applicant: Toshiyuki Mine , Kan Yasui , Tetsuya Ishimaru , Yasuhiro Shimamoto
- Applicant Address: JP Kawasaki-shi
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Kawasaki-shi
- Agency: Miles & Stockbridge P.C.
- Priority: JP2006-013276 20060123
- Main IPC: H01L21/336
- IPC: H01L21/336 ; H01L21/31

Abstract:
Performance of a non-volatile semiconductor storage device which performs electron writing by hot electrons and hole erasure by hot holes is improved. A non-volatile memory cell which performs a writing operation by electrons and an erasure operation by holes has a p-type well region, isolation regions, a source region, and a drain region provided on an Si substrate. A control gate electrode is formed via a gate insulating film between the source region and the drain region. In a left-side side wall of the control gate electrode, a bottom Si oxide film, an electric charge holding film, a top Si oxide film, and a memory gate electrode are formed. The electric charge holding film is formed from an Si nitride film stoichiometrically excessively containing silicon.
Public/Granted literature
- US20070170495A1 Non-volatile semiconductor storage device and manufacturing method of the same Public/Granted day:2007-07-26
Information query
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