Invention Grant
- Patent Title: High voltage SCRMOS in BiCMOS process technologies
- Patent Title (中): BiCMOS工艺技术中的高电压SCRMOS
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Application No.: US12694872Application Date: 2010-01-27
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Publication No.: US08125030B2Publication Date: 2012-02-28
- Inventor: Sameer P. Pendharkar
- Applicant: Sameer P. Pendharkar
- Applicant Address: US TX Dallas
- Assignee: Texas Instruments Incorporated
- Current Assignee: Texas Instruments Incorporated
- Current Assignee Address: US TX Dallas
- Agent Jacqueline J. Garner; Wade J. Brady III; Frederick J. Telecky Jr.
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
An integrated circuit containing an SCRMOS transistor. The SCRMOS transistor has one drain structure with a centralized drain diffused region and distributed SCR terminals, and a second drain structure with distributed drain diffused regions and SCR terminals. An MOS gate between the centralized drain diffused region and a source diffused region is shorted to the source diffused region. A process of forming the integrated circuit having the SCRMOS transistor is also disclosed.
Public/Granted literature
- US20110180842A1 HIGH VOLTAGE SCRMOS IN BiCMOS PROCESS TECHNOLOGIES Public/Granted day:2011-07-28
Information query
IPC分类: