Invention Grant
- Patent Title: High-density flip-chip interconnect
- Patent Title (中): 高密度倒装芯片互连
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Application No.: US09789401Application Date: 2001-02-20
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Publication No.: US08125087B2Publication Date: 2012-02-28
- Inventor: Mark P. Jamieson
- Applicant: Mark P. Jamieson
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP
- Main IPC: H01L23/52
- IPC: H01L23/52

Abstract:
An interconnect routing for a card or interposer or the like, including splines of traces on a first layer and traces on a second layer, with vias connecting between the layers. Outer rows of signals are routed out from a chip on the first layer, while inner rows of signals are viad down to the second layer where they are routed out, then viad back up to the first layer. These outer vias are arranged in an arc, enabling the second layer trace segments to be of a more uniform length. The second layer may also include ground or power plane fingers extending between the splines and viad up to ground or power signals of the chip.
Public/Granted literature
- US20020113307A1 High-density flip-chip interconnect Public/Granted day:2002-08-22
Information query
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