Invention Grant
- Patent Title: Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
- Patent Title (中): 用于防止或减少浸没型投影装置和浸入式光刻设备的污染的方法
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Application No.: US11292311Application Date: 2005-12-02
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Publication No.: US08125610B2Publication Date: 2012-02-28
- Inventor: Jan Cornelis Van Der Hoeven
- Applicant: Jan Cornelis Van Der Hoeven
- Applicant Address: NL Veldhoven
- Assignee: ASML Metherlands B.V.
- Current Assignee: ASML Metherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/58
Abstract:
A method for preventing or reducing contamination of an immersion type projection apparatus is provided. The apparatus includes at least one immersion space that is at least partially filled with a liquid when the apparatus projects a beam of radiation onto a substrate. The method includes rinsing at least part of the immersion space with a rinsing liquid before the apparatus is used to project the beam of radiation onto a substrate.
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