A lithographic apparatus includes, in an embodiment, an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a flexible transportation line extending between a first and second part of the apparatus, the second part moveable with respect to the first part, wherein the line is pre-formed in a three-dimensional curve.