Invention Grant
- Patent Title: Modeling conductive patterns using an effective model
- Patent Title (中): 使用有效模型建模导电图案
-
Application No.: US12114700Application Date: 2008-05-02
-
Publication No.: US08126694B2Publication Date: 2012-02-28
- Inventor: Zhuan Liu , Jiangtao Hu , Yudong Hao
- Applicant: Zhuan Liu , Jiangtao Hu , Yudong Hao
- Applicant Address: US CA Milpitas
- Assignee: Nanometrics Incorporated
- Current Assignee: Nanometrics Incorporated
- Current Assignee Address: US CA Milpitas
- Agency: Silicon Valley Patent Group LLP
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G06F17/00 ; G06G7/62

Abstract:
A model of a sample with a periodic or non-periodic pattern of conductive and transparent materials is produced based on the effect that the pattern has on TE polarized incident light. The model of the pattern may include a uniform film of the transparent material and an underlying uniform film of the conductive material. When the pattern has periodicity in two directions, the model may include a uniform film of the transparent material and an underlying portion that based on the physical characteristics of the periodic pattern in the TM polarization direction. When the sample includes an underlying periodic pattern that is orthogonal to the top periodic pattern, the sample may be modeled by modeling the physical characteristics of the top periodic pattern and the effect of the bottom periodic pattern. The model may be stored and used to determine a characteristic of the sample.
Public/Granted literature
- US20090276198A1 Modeling Conductive Patterns Using An Effective Model Public/Granted day:2009-11-05
Information query