Invention Grant
- Patent Title: Gate-length biasing for digital circuit optimization
- Patent Title (中): 栅极长度偏置用于数字电路优化
-
Application No.: US12212353Application Date: 2008-09-17
-
Publication No.: US08127266B1Publication Date: 2012-02-28
- Inventor: Puneet Gupta , Andrew B. Kahng
- Applicant: Puneet Gupta , Andrew B. Kahng
- Applicant Address: US CA Los Gatos
- Assignee: Tela Innovations, Inc.
- Current Assignee: Tela Innovations, Inc.
- Current Assignee Address: US CA Los Gatos
- Agency: Martine Penilla Group, LLP
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G06F15/04

Abstract:
Methods and apparatus for a gate-length biasing methodology for optimizing integrated digital circuits are described. The gate-length biasing methodology replaces a nominal gate-length of a transistor with a biased gate-length, where the biased gate-length includes a bias length that is small compared to the nominal gate-length. In an exemplary embodiment, the bias length is less than 10% of the nominal gate-length.
Information query