Invention Grant
- Patent Title: Wiring substrate, method of manufacturing wiring substrate, and electronic apparatus
- Patent Title (中): 布线基板,布线基板的制造方法以及电子设备
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Application No.: US11866657Application Date: 2007-10-03
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Publication No.: US08127438B2Publication Date: 2012-03-06
- Inventor: Toshiki Hara
- Applicant: Toshiki Hara
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2006-309239 20061115
- Main IPC: H05K3/36
- IPC: H05K3/36 ; H05K3/20 ; H05K3/30 ; H01L21/00

Abstract:
A method of manufacturing a wiring substrate includes the steps of bonding a first substrate, which includes a pixel area and a drive area located around the pixel area, and is provided with a protruding section formed in the pixel area, to a second substrate on which a peripheral circuit is disposed, so that the peripheral circuit faces the drive area, and separating the second substrate from the first substrate while leaving the peripheral circuit on the first substrate. In the step of bonding the first and the second substrates, the peripheral circuit is pressure-bonded to the first substrate, and the protruding section is made abut on the second substrate in the pixel area.
Public/Granted literature
- US20080110017A1 WIRING SUBSTRATE, METHOD OF MANUFACTURING WIRING SUBSTRATE, AND ELECTRONIC APPARATUS Public/Granted day:2008-05-15
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