Invention Grant
- Patent Title: Particulate sampling apparatus, particulate sampling substrate and particulate sampling method
- Patent Title (中): 微粒取样装置,微粒取样基质和微粒取样法
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Application No.: US12257355Application Date: 2008-10-23
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Publication No.: US08127624B2Publication Date: 2012-03-06
- Inventor: Gakuji Hashimoto , Motohiro Furuki , Kenji Sugawara
- Applicant: Gakuji Hashimoto , Motohiro Furuki , Kenji Sugawara
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JPP2007-277082 20071025
- Main IPC: G01N1/22
- IPC: G01N1/22

Abstract:
A particulate sampling apparatus configured to control the flow direction of a dispersion solvent for particulates, at a channel branching section of a channel includes an introduction channel capable of introducing the dispersion solvent, and a plurality of branch channels communicating with the introduction channel, so as to disperse desired ones of the particulates into a selected one of the branch channels, wherein the apparatus includes light irradiation means by which a bubble can be generated in the dispersion solvent by irradiation with a laser beam used as a heat source, and the flow direction of the dispersion solvent at the channel branching section is controlled by the bubble.
Public/Granted literature
- US20090107262A1 PARTICULATE SAMPLING APPARATUS, PARTICULATE SAMPLING SUBSTRATE AND PARTICULATE SAMPLING METHOD Public/Granted day:2009-04-30
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