Invention Grant
- Patent Title: Protective tape cutting method for semiconductor wafer and device of the same
- Patent Title (中): 半导体晶圆的保护带切割方法及其装置
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Application No.: US12276343Application Date: 2008-11-23
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Publication No.: US08127647B2Publication Date: 2012-03-06
- Inventor: Naoki Ishii , Masayuki Yamamoto
- Applicant: Naoki Ishii , Masayuki Yamamoto
- Applicant Address: JP Osaka
- Assignee: Nitto Denko Corporation
- Current Assignee: Nitto Denko Corporation
- Current Assignee Address: JP Osaka
- Agency: Cheng Law Group, PLLC
- Priority: JP2007-306104 20071127
- Main IPC: B32B38/04
- IPC: B32B38/04

Abstract:
A cutter blade is relatively moved along an outer periphery of a semiconductor wafer, and dust generated at a tape cutting site by the cutter blade and attached to an upper surface of the protective tape is collected with a dust collecting member which relatively moves with the cutter blade with respect to the semiconductor wafer, and the dust collected at a predetermined portion is suctioned and removed with a suction nozzle after the completion of tape cutting.
Public/Granted literature
- US20090133549A1 PROTECTIVE TAPE CUTTING METHOD FOR SEMICONDUCTOR WAFER AND DEVICE OF THE SAME Public/Granted day:2009-05-28
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