Invention Grant
- Patent Title: Nozzle plate, method for manufacturing nozzle plate, droplet discharge head, and droplet discharge device
- Patent Title (中): 喷嘴板，喷嘴板的制造方法，液滴喷射头和液滴喷射装置
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Application No.: US12507947Application Date: 2009-07-23
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Publication No.: US08128202B2Publication Date: 2012-03-06
- Inventor: Yasuhide Matsuo , Kenji Otsuka , Kazuo Higuchi , Kosuke Wakamatsu
- Applicant: Yasuhide Matsuo , Kenji Otsuka , Kazuo Higuchi , Kosuke Wakamatsu
- Applicant Address: JP
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2008-194505 20080729
- Main IPC: B41J2/135
- IPC: B41J2/135
Abstract:
A nozzle plate includes: a nozzle for discharging a liquid as droplets; a liquid-repellent film suppressing attachment of the droplets on one surface of the nozzle plate; and a first bonding film formed on the other surface of the nozzle plate and bonded with a substrate. In the nozzle plate, the liquid-repellent film includes a first plasma polymerized film having a Si skeleton, which includes a siloxane (Si—O) bond and has a random atomic structure, and an elimination group bonded with the Si skeleton.
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