Invention Grant
- Patent Title: Plating apparatus and plating method
- Patent Title (中): 电镀装置及电镀方法
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Application No.: US12182745Application Date: 2008-07-30
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Publication No.: US08128790B2Publication Date: 2012-03-06
- Inventor: Yasuaki Tachi , Shigeki Sawa , Toshiyuki Kasuga
- Applicant: Yasuaki Tachi , Shigeki Sawa , Toshiyuki Kasuga
- Applicant Address: JP Ogaki-shi
- Assignee: Ibiden Co., Ltd.
- Current Assignee: Ibiden Co., Ltd.
- Current Assignee Address: JP Ogaki-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-020922 20060130
- Main IPC: C25D17/00
- IPC: C25D17/00

Abstract:
An apparatus that performs an electrolytic plating on a plating surface of a belt substrate is provided. The apparatus includes a plating tank, a conveyor device configured to carry a belt substrate through an interior of the plating tank, an immersed cathode power-supply section provided within the interior of the plating tank, an auxiliary cathode power-supply section provided within the interior of the plating tank, and short-circuit wiring configured to short-circuit the immersed cathode power-supply section to the auxiliary cathode power-supply section. A plating method for performing electrolytic plating on a plating surface of a belt substrate is provided. The method includes conveying the belt substrate through a plating tank, making the plating surface a cathode by contacting at least one of an immersed cathode power-supply section or an auxiliary cathode power-supply section with the belt substrate, and short-circuiting the immersed cathode power-supply section to the auxiliary cathode power-supply section.
Public/Granted literature
- US20090032404A1 PLATING APPARATUS AND PLATING METHOD Public/Granted day:2009-02-05
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