Invention Grant
- Patent Title: Processes and materials for step and flash imprint lithography
- Patent Title (中): 步进和闪光压印光刻的工艺和材料
-
Application No.: US12051584Application Date: 2008-03-19
-
Publication No.: US08128832B2Publication Date: 2012-03-06
- Inventor: Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
- Applicant: Richard Anthony DiPietro , Mark Whitney Hart , Frances Anne Houle , Hiroshi Ito
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Schmeiser, Olsen & Watts
- Main IPC: H01L21/302
- IPC: H01L21/302

Abstract:
A method of forming an image. The method includes: a transfer layer on a substrate; forming on the transfer layer, an etch barrier layer; pressing a template having a relief pattern into the etch barrier layer; exposing the etch barrier layer to actinic radiation forming a cured etch barrier layer having thick and thin regions corresponding to the relief pattern; removing the template; removing the thin regions of the cured etch barrier layer; removing regions of the transfer layer not protected by the etch barrier layer; removing regions of the substrate not protected by the transfer layer and any remaining etch barrier layer; and removing remaining transfer layer. The transfer layer may be removed using a solvent, the etch barrier layer may include a release agent and an adhesion layer may be formed between the transfer layer and the etch barrier layer. A reverse tone process is also described.
Public/Granted literature
- US20080169268A1 PROCESSES AND MATERIALS FOR STEP AND FLASH IMPRINT LITHOGRAPHY Public/Granted day:2008-07-17
Information query
IPC分类: