Invention Grant
- Patent Title: High-luminosity stress-stimulated luminescent material, manufacturing method thereof, and use thereof
- Patent Title (中): 高亮度应力刺激发光材料及其制造方法及其应用
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Application No.: US11547660Application Date: 2005-04-08
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Publication No.: US08128839B2Publication Date: 2012-03-06
- Inventor: Chao-Nan Xu
- Applicant: Chao-Nan Xu
- Applicant Address: JP Tokyo
- Assignee: National Institute of Advanced Industrial Science & Technology
- Current Assignee: National Institute of Advanced Industrial Science & Technology
- Current Assignee Address: JP Tokyo
- Agency: Nixon & Vanderhye PC
- Priority: JP2004-116250 20040409
- International Application: PCT/JP2005/006971 WO 20050408
- International Announcement: WO2005/097946 WO 20051020
- Main IPC: C09K11/64
- IPC: C09K11/64

Abstract:
The present invention provide a high-luminosity stress-stimulated luminescent material which emits visible light even in daylight, a manufacturing method thereof, and a typical example of the use thereof. The stress-stimulated luminescent material of the present invention satisfies conditions for light emission by at least one of: a luminescence mechanism using static electricity caused by friction; a luminescence mechanism using micro plasma caused by friction; a luminescence mechanism using a piezoelectric effect caused by strain; a luminescence mechanism using lattice defect; and a luminescence mechanism using thermal generation. For example, in case where a base material made of at least one type of aluminate is includes as the stress-stimulated luminescent material, the base material includes a crystal structure with spontaneous polarization, e.g. α-SrAl2O4, in order to realize the luminescence mechanism using the piezoelectric effect caused by strain.
Public/Granted literature
- US20080232083A1 High-Luminosity Stress-Stimulated Luminescent Material, Manufacturing Method Thereof, and Use Thereof Public/Granted day:2008-09-25
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