Invention Grant
- Patent Title: Methods utilizing reversibly adhesive layers for forming patterned microstructures
- Patent Title (中): 利用可逆粘合剂层形成图案化微结构的方法
-
Application No.: US12727518Application Date: 2010-03-19
-
Publication No.: US08128858B2Publication Date: 2012-03-06
- Inventor: Ricky K. Soong
- Applicant: Ricky K. Soong
- Applicant Address: US MA Cambridge
- Assignee: The Charles Stark Draper Laboratory, Inc.
- Current Assignee: The Charles Stark Draper Laboratory, Inc.
- Current Assignee Address: US MA Cambridge
- Agency: Goodwin Procter LLP
- Main IPC: B29C35/08
- IPC: B29C35/08 ; B29C33/56 ; B28B7/36
Abstract:
A method for forming a nano/microstructure includes applying a release coating having a transition temperature to a mold, the release coating promoting adhesion thereto at temperatures below the transition temperature and release at temperatures above the transition temperature. A cast material is adhered to the release coating at a first temperature below the transition temperature and released from the mold by exposing the release coating to a second temperature greater than the transition temperature.
Public/Granted literature
- US20100244332A1 METHODS UTILIZING REVERSIBLY ADHESIVE LAYERS FOR FORMING PATTERNED MICROSTRUCTURES Public/Granted day:2010-09-30
Information query
IPC分类:
