Invention Grant
- Patent Title: Multilayer structure and process for producing a multilayer structure
- Patent Title (中): 多层结构和制造多层结构的方法
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Application No.: US11253551Application Date: 2005-10-20
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Publication No.: US08129042B2Publication Date: 2012-03-06
- Inventor: Nobuhiro Oosaki , Taiichi Sakaya
- Applicant: Nobuhiro Oosaki , Taiichi Sakaya
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2004-307957 20041022
- Main IPC: B32B7/02
- IPC: B32B7/02 ; B32B9/04

Abstract:
Disclosed is a multilayer structure including a first layer and a second layer adjacent to the first layer, wherein the first layer is formed of a first material comprising a first inorganic laminar compound and a second layer is formed of a second material comprising a second inorganic laminar compound with a volume fraction greater than the volume fraction of the first inorganic laminar compound in the first layer. The multilayer structure may includes a substrate layer. A method for producing the multilayer structure is also disclosed.
Public/Granted literature
- US20060088707A1 Multilayer structure and process for producing a multilayer structure Public/Granted day:2006-04-27
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