Invention Grant
- Patent Title: Variable resist protecting groups
- Patent Title (中): 可变抗蚀剂保护基
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Application No.: US12561001Application Date: 2009-09-16
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Publication No.: US08129080B2Publication Date: 2012-03-06
- Inventor: Carlos A. Fonseca , Mark Somervell , Steven Scheer
- Applicant: Carlos A. Fonseca , Mark Somervell , Steven Scheer
- Applicant Address: JP
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP
- Main IPC: G03F7/00
- IPC: G03F7/00
Abstract:
A method and system for patterning a substrate using a dual-tone development process is described. The method and system comprise using a resist material having a polymer backbone with a plurality of protecting groups attached thereto to improve process latitude and critical dimension uniformity for the dual-tone development process.
Public/Granted literature
- US20100075238A1 Variable Resist Protecting Groups Public/Granted day:2010-03-25
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