Invention Grant
US08129095B2 Methods, photomasks and methods of fabricating photomasks for improving damascene wire uniformity without reducing performance
有权
方法，光掩模和制造光掩模的方法，以改善镶嵌丝均匀性而不降低性能
- Patent Title: Methods, photomasks and methods of fabricating photomasks for improving damascene wire uniformity without reducing performance
- Patent Title (中): 方法，光掩模和制造光掩模的方法，以改善镶嵌丝均匀性而不降低性能
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Application No.: US12622461Application Date: 2009-11-20
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Publication No.: US08129095B2Publication Date: 2012-03-06
- Inventor: Casey Jon Grant , Jude L. Hankey
- Applicant: Casey Jon Grant , Jude L. Hankey
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Schmeiser, Olsen & Watts
- Agent Richard Kotulak
- Main IPC: G03F7/16
- IPC: G03F7/16 ; G03F7/40
Abstract:
A method of improving damascene wire uniformity without reducing performance. The method includes simultaneously forming a multiplicity of damascene wires and a multiplicity of metal dummy shapes in a dielectric layer of a wiring level of an integrated circuit chip, the metal dummy shapes being dispersed between damascene wires of the multiplicity of damascene wires; and removing or modifying those metal dummy shapes of the multiplicity of metal dummy shapes within exclusion regions around selected damascene wires of the multiplicity of damascene wires. Also a method of fabricating a photomask and a photomask for use in improving damascene wire uniformity without reducing performance.
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