Invention Grant
- Patent Title: Substrate device having a tuned work function and methods of forming thereof
- Patent Title (中): 具有调谐功能的基板装置及其形成方法
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Application No.: US12508820Application Date: 2009-07-24
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Publication No.: US08129280B2Publication Date: 2012-03-06
- Inventor: Rongjun Wang , Xianmin Tang , Dengliang Yang , Zhendong Liu , Srinivas Gandikota
- Applicant: Rongjun Wang , Xianmin Tang , Dengliang Yang , Zhendong Liu , Srinivas Gandikota
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agent Alan Taboada; Moser Taboada
- Main IPC: H01L21/311
- IPC: H01L21/311
Abstract:
Substrate devices having tuned work functions and methods of forming thereof are provided. In some embodiments, forming devices on substrates may include depositing a dielectric layer atop a substrate having a conductivity well; depositing a work function layer comprising titanium aluminum or titanium aluminum nitride having a first nitrogen composition atop the dielectric layer; etching the work function layer to selectively remove at least a portion of the work function layer from atop the dielectric layer; depositing a layer comprising titanium aluminum or titanium aluminum nitride having a second nitrogen composition atop the work function layer and the substrate, wherein at least one of the work function layer or the layer comprises nitrogen; etching the layer and the dielectric layer to selectively remove a portion of the layer and the dielectric layer from atop the substrate; and annealing the substrate at a temperature less than about 1500 degrees Celsius.
Public/Granted literature
- US20110018073A1 SUBSTRATE DEVICE HAVING A TUNED WORK FUNCTION AND METHODS OF FORMING THEREOF Public/Granted day:2011-01-27
Information query
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