Invention Grant
- Patent Title: Plasma supply device
- Patent Title (中): 等离子体供应装置
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Application No.: US12166963Application Date: 2008-07-02
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Publication No.: US08129653B2Publication Date: 2012-03-06
- Inventor: Thomas Kirchmeier , Hans-Juergen Windisch , Hanns-Joachim Knaus , Michael Glueck , Gerd Hintz
- Applicant: Thomas Kirchmeier , Hans-Juergen Windisch , Hanns-Joachim Knaus , Michael Glueck , Gerd Hintz
- Applicant Address: DE Freiburg
- Assignee: HUETTINGER Elektronik GmbH + Co. KG
- Current Assignee: HUETTINGER Elektronik GmbH + Co. KG
- Current Assignee Address: DE Freiburg
- Agency: Fish & Richardson P.C.
- Main IPC: B23K10/00
- IPC: B23K10/00

Abstract:
A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network. The output network is arranged on a printed circuit board. The output network can therefore be designed low priced and accurately.
Public/Granted literature
- US20090026968A1 PLASMA SUPPLY DEVICE Public/Granted day:2009-01-29
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