Invention Grant
- Patent Title: Charged particle beam apparatus including aberration corrector
- Patent Title (中): 带有像差校正器的带电粒子束装置
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Application No.: US12367811Application Date: 2009-02-09
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Publication No.: US08129680B2Publication Date: 2012-03-06
- Inventor: Kotoko Hirose , Takeshi Kawasaki , Tomonori Nakano
- Applicant: Kotoko Hirose , Takeshi Kawasaki , Tomonori Nakano
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Mattingly & Malur, PC
- Priority: JP2008-040815 20080222
- Main IPC: G01N23/225
- IPC: G01N23/225

Abstract:
A focused charged particle beam apparatus including an aberration corrector, capable of finding the absolute value of the aberration coefficient at high speed, and capable of making high-accuracy adjustments at high speed. A deflection coil tilts the input beam relative to the object point, and measures the defocus data and aberration quantity at high speed while the beam is tilted from one image, and perform least squares fitting on these results to find the absolute value of the aberration coefficient prior to tilting the beam, and to adjust the aberration corrector.
Public/Granted literature
- US20090212228A1 CHARGED PARTICLE BEAM APPARATUS INCLUDING ABERRATION CORRECTOR Public/Granted day:2009-08-27
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