Invention Grant
- Patent Title: Semiconductor device and method for fabricating the same
- Patent Title (中): 半导体装置及其制造方法
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Application No.: US11396436Application Date: 2006-04-03
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Publication No.: US08129721B2Publication Date: 2012-03-06
- Inventor: Shunpei Yamazaki , Jun Koyama , Toru Takayama , Toshiji Hamatani
- Applicant: Shunpei Yamazaki , Jun Koyama , Toru Takayama , Toshiji Hamatani
- Applicant Address: JP
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP
- Agency: Husch Blackwell LLP
- Priority: JP11-104646 19990412
- Main IPC: H01L29/04
- IPC: H01L29/04

Abstract:
The invention primarily provides gate electrodes and gate wirings permitting large-sized screens for active matrix-type display devices, wherein, in order to achieve this object, the construction of the invention is a semiconductor device having, on the same substrate, a pixel TFT provided in a display region and a driver circuit TFT provided around the display region, wherein the gate electrodes of the pixel TFT and the driver circuit TFT are formed from a first conductive layer, the gate electrodes are in electrical contact through connectors with gate wirings formed from a second conductive layer, and the connectors are provided outside the channel-forming regions of the pixel TFT and the driver circuit TFT.
Public/Granted literature
- US20060249733A1 Semiconductor device and method for fabricating the same Public/Granted day:2006-11-09
Information query
IPC分类: