Invention Grant
US08129814B2 Schottky diode with silicide anode and anode-encircling P-type doped region
有权
肖特基二极管与硅化物阳极和阳极环绕P型掺杂区域
- Patent Title: Schottky diode with silicide anode and anode-encircling P-type doped region
- Patent Title (中): 肖特基二极管与硅化物阳极和阳极环绕P型掺杂区域
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Application No.: US13085102Application Date: 2011-04-12
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Publication No.: US08129814B2Publication Date: 2012-03-06
- Inventor: Sameer Prakash Pendharkar , Eugen Pompiliu Mindricelu
- Applicant: Sameer Prakash Pendharkar , Eugen Pompiliu Mindricelu
- Applicant Address: US TX Dallas
- Assignee: Texas Instruments Incorporated
- Current Assignee: Texas Instruments Incorporated
- Current Assignee Address: US TX Dallas
- Agent John R. Pessetto; W. James Brady; Frederick J. Telecky, Jr.
- Main IPC: H01L27/095
- IPC: H01L27/095 ; H01L29/792

Abstract:
An integrated circuit includes a Schottky diode having a cathode defined by an n-type semiconductor region, an anode defined by a cobalt silicide region, and a p-type region laterally annularly encircling the cobalt silicide region. The resulting p-n junction forms a depletion region under the Schottky junction that reduces leakage current through the Schottky diodes in reverse bias operation. An n+-type contact region is laterally separated by the p-type region from the first silicide region and a second cobalt silicide region is formed in the n-type contact region. The silicided regions are defined by openings in a silicon blocking dielectric layer. Dielectric material is left over the p-type region. The p-type region may be formed simultaneously with source/drain regions of a PMOS transistor.
Public/Granted literature
- US20110186933A1 SCHOTTKY DIODE WITH SILICIDE ANODE AND ANODE-ENCIRCLING P-TYPE DOPED REGION Public/Granted day:2011-08-04
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